Arnea Laboratory Co., Ltd. wafer thickness measurement device
The thickness of the silicon substrate is measured in real-time with high sensitivity and non-contact using a wavelength scanning method.
- Non-contact measurement of wafer thickness such as silicon and indium phosphide - Measurement possible in harsh environments, such as real-time measurement during wet etching - High sensitivity measurement with a precisely controlled wavelength-variable light source - High reproducibility with a measurement accuracy of less than 0.1μm - Customizable for measurement targets, sizes, and shapes other than silicon
- Company:兼松PWS
- Price:Other